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Objective lenses

Objective lenses
Objective lens is the lens located closest to the object in optical instruments, and the objective lenses of telescopes and microscopes are typical. The objective lens is the most important optical unit that determines the basic performance and functions of an optical microscope.
We are good at designing and manufacturing the highest quality objective lenses in the ultraviolet wavelength range.
Features
Refraction type, reflection type, reflection refraction type are available
High NA (~ 0.95)
Wide field of view (~ φ6mm)
Performance guarantee due to wave surface aberration
Use
Semiconductor photomask inspection
Semiconductor wafer inspection
Mask lighter
Laser processing
High NA UV Objective lens(No adhesive used) (pdf, 434KB)
Objective lenses for mask and wafer inspection (pdf, 526KB)
Temperature Change Resistant Titanium Objective Lens (pdf, 303KB)
Applications
Laser processing machine, solar cell manufacturing and inspection system, semiconductor manufacturing and inspection system, LCD manufacturing and inspection system, etc.
Specification examples
High NA UV Objective lens(No adhesive used) (pdf, 434KB)
Molel No | Wavelength | Focal length | NA | Field of view | WD |
---|---|---|---|---|---|
CA266-4085 | 266nm | 4mm | 0.85 | φ0.45mm | 1mm |
CA355-4085 | 355nm | ||||
Objective lenses for mask and wafer inspection (pdf, 526KB)
Molel No | Wavelength | Focal length | NA | Field of view | WD |
---|---|---|---|---|---|
MI193-5085 | 193nm | 5mm | 0.85 | φ0.45mm | 8mm |
MI213-5085 | 213nm | ||||
MI248-5085 | 248nm | ||||
MI266-5085 | 266nm | ||||
MI355-5085 | 355nm |
Objective lenses for excimer laser processing
Model No. | Wavelength | Focal length | NA | Processing area | WD | Window |
---|---|---|---|---|---|---|
KVH20-8 | 248~266nm/546nm | 20mm | 0.2 | 0.5mm | 10.2mm | Replaceable |
KVH40-9.6 | 248~266nm/546nm | 40mm | 0.12 | 2mm | 24mm | Replaceable |
KV100-25 | 248nm | 100mm | 0.125 | 2mm | 70mm | N/A |
KV200-25 | 248nm | 200mm | 0.05 | 4mm | 192mm | N/A |
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