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Objective lenses for mask / wafer inspection
Wide field of view・Long working distance and Aberration-free
The MI series of objective lenses for mask / wafer inspection have co-functioning with a wide field of view, long working distance and aberration-free, and are suitable for semiconductor photomask / wafer inspection.
Customized support for interface section and various relay lenses is available.
Key features
- Features
-
- From its refractive optical system, it has no shielding , but long working distance.
- It is achromatic within the spectrum of the laser, resulting in good imaging properties.
- The design performance is numerically guaranteed by measuring wavefront aberration with an interferometer.
- Suitable for semiconductor mask / wafer observation applications.
- Applications
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- Semiconductor wafer inspection equipment
- Semiconductor mask inspection equipment
- Sample for an evaluation of transmitted wavefront aberration (MI266-5085)
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Specification examples
| Model No. | MI193-5085 | MI266-5085 | MI355-5085 |
| Wavelength | 193nm | 266nm | 355nm |
| Banswidth （full wodth at half mximum） |
8pm | 5pm | 20pm |
| Type | Refractive type | ||
| Numerical aperture(NA) | 0.85 | ||
| Focal length | 5mm | ||
| Transmittance | ≧80% | ||
| Wavefront aberration (monochromatic) |
≦0.03wave rms | ||
| Field of view | Φ0.3mm | Φ0.45mm | |
| Working distance | ≧8mm | ||
| Weight | Approx.4.3kg | Approx.4.8kg | |
| Operating temperature | 23±0.5℃ | ||
Dimensions
- MI193
-
- MI-266/355
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- UV objective lenses
- Objective lenses for mask / wafer inspection